Plasma-deposited a-C(N): H films
نویسندگان
چکیده
منابع مشابه
Electrical Properties of Plasma Deposited Thin Films
Abstract. It is well known that MIM (metal-insulator-metal) structures exhibit various high-field processes, which may be either electrode-limited (e.g. tunneling, Schottky-barrier emission) or bulk-limited (e.g. space-charge-limited conduction, Poole-Frenkel conduction). Thin films prepared using PECVD (plasma-enhanced chemical vapour deposition)exhibited Pool-Frenkel conductivity (Schottky co...
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'G. C. Salter and R. E. Thomas, Solid State Electron. 20, 95 (1977). 2p. Van Halen, R. P. Mertens, R. J. Van Overstraeten, R. E. Thomas, and J. Van Meerbergen, IEEE Trans. Electron Devices ED.25, 507 (19781. -c. E. Norman and R. E. Thomas, IEEE Trans. Electron Devices ED-27, 731 (1980). 4R. E. Thomas, R. B. North, and C. E. Norman, IEEE Electron Device Lett. EDL-l, 79 (1980). Sp. DeVisschere, I...
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Raman spectroscopy is employed to characterize thin diamond films deposited by microwave plasma assisted chemical vapour deposition technique using a gas mixture of methane and hydrogen. The surface morphology of the films was analyzed by scanning electron microscopy. We have identified submicron crystals on (100) facets of diamond crystals which gave rise to bands in the Raman spectrum centred...
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ژورنال
عنوان ژورنال: Brazilian Journal of Physics
سال: 2000
ISSN: 0103-9733
DOI: 10.1590/s0103-97332000000300007